Wavelength converters, including polarization-enhanced carrier capture converters, for solid state lighting devices, and associated systems and methods

ABSTRACT

Wavelength converters, including polarization-enhanced carrier capture converters, for solid state lighting devices, and associated systems and methods are disclosed. A solid state radiative semiconductor structure in accordance with a particular embodiment includes a first region having a first value of a material characteristic and being positioned to receive radiation at a first wavelength. The structure can further include a second region positioned adjacent to the first region to emit radiation at a second wavelength different than the first wavelength. The second region has a second value of the material characteristic that is different than the first value, with the first and second values of the characteristic forming a potential gradient to drive electrons, holes, or both electrons and holes in the radiative structure from the first region to the second region. In a further particular embodiment, the material characteristic includes material polarization.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a continuation of U.S. application Ser. No.16/134,813, filed Sep. 18, 2018; which is a continuation of U.S.application Ser. No. 15/083,063, filed Mar. 28, 2016, now U.S. Pat. No.10,096,748; which is a continuation of U.S. application Ser. No.13/216,062, filed Aug. 23, 2011, now U.S. Pat. No. 9,331,252; each ofwhich is incorporated herein by reference in its entirety.

TECHNICAL FIELD

The present technology is directed generally to wavelength converters,including polarization-enhanced carrier capture converters, for solidstate lighting devices, and associated systems and methods. Wavelengthconverters in accordance with the present technology are suitable forLEDs and other radiation emitting devices.

BACKGROUND

Solid state lighting (“SSL”) devices are used in a wide variety ofproducts and applications. For example, mobile phones, personal digitalassistants (“PDAs”), digital cameras, MP3 players, and other portableelectronic devices utilize SSL devices (e.g., LEDs) for backlighting andother purposes. SSL devices are also used for signage, indoor lighting,outdoor lighting, and other types of general illumination. FIG. 1A is across-sectional view of a conventional SSL device 10 a with lateralcontacts. As shown in FIG. 1A, the SSL device 10 a includes a substrate20 carrying an LED structure 11 having an active region 14, e.g.,containing gallium nitride/indium gallium nitride (GaN/InGaN) multiplequantum wells (“MQWs”), positioned between N-type GaN 15 and P-type GaN16. The SSL device 10 a also includes a first contact 17 on the P-typeGaN 16 and a second contact 19 on the N-type GaN 15. The first contact17 typically includes a transparent and conductive material (e.g.,indium tin oxide (“ITO”)) to allow light to escape from the LEDstructure 11. In operation, electrical power is provided to the SSLdevice 10 a via the contacts 17, 19, causing the active region 14 toemit light.

FIG. 1B is a cross-sectional view of another conventional LED device 10b in which the first and second contacts 17 and 19 are opposite eachother, e.g., in a vertical rather than lateral configuration. Duringformation of the LED device 10 b, a growth substrate, similar to thesubstrate 20 shown in FIG. 1A, initially carries an N-type GaN 15, anactive region 14 and a P-type GaN 16. The first contact 17 is disposedon the P-type GaN 16, and a carrier 21 is attached to the first contact17. The substrate 20 is removed, allowing the second contact 19 to bedisposed on the N-type GaN 15. The structure is then inverted to producethe orientation shown in FIG. 1B. In the LED device 10 b, the firstcontact 17 typically includes a reflective and conductive material(e.g., silver or aluminum) to direct light toward the N-type GaN 15.

One drawback with existing LEDs is that they do not emit white light.Instead, LEDs typically emit light within only a narrow wavelengthrange. For human eyes to perceive the color white, a broad range ofwavelengths is needed. Accordingly, one conventional technique foremulating white light with LEDs is to deposit a converter material(e.g., a phosphor) on an LED die. FIG. 1C shows a conventional SSLdevice 10 c that includes a support 2 carrying an LED die 4 and aconverter material 6. In operation, an electrical voltage is applied tothe die 4 via contacts having an arrangement generally similar to thatshown in either FIG. 1A or FIG. 1B. In response to the applied voltage,the active region of the LED die 4 produces a first emission (e.g., ablue light) that stimulates the converter material 6 to emit a secondemission (e.g., a yellow light). The combination of the first and secondemissions appears white to human eyes if matched appropriately. Asdiscussed in more detail below, using phosphor converter materials to“convert” blue light into white light has certain drawbacks.Accordingly, there is a need for light emitting devices that can producelight at a particular wavelength without phosphor converter materials.

BRIEF DESCRIPTION OF THE DRAWINGS

Many aspects of the present disclosure can be better understood withreference to the following drawings. The components in the drawings arenot necessarily to scale. Instead, emphasis is placed on clearlyillustrating the principles of the present disclosure. Moreover, in thedrawings, like reference numerals designate corresponding partsthroughout the several views.

FIG. 1A is a partially schematic, cross-sectional diagram of an SSLdevice having a lateral arrangement in accordance with the prior art.

FIG. 1B is a partially schematic, cross-sectional diagram of another SSLdevice having a vertical arrangement in accordance with the prior art.

FIG. 1C is a partially schematic, cross-sectional diagram of a lightemitting device having a phosphor converter material positioned inaccordance with the prior art.

FIG. 2 is a partially schematic, cross-sectional illustration of asystem that includes a light source and a radiative structure configuredin accordance with an embodiment of the presently disclosed technology.

FIGS. 3A-3F are schematic, perspective views of various crystal planesin a GaN/InGaN material in accordance with embodiments of the presentlydisclosed technology.

FIG. 4 is a band diagram illustrating interfaces between materialshaving different material polarizations in accordance with an embodimentof the presently disclosed technology.

FIG. 5 is a partially schematic illustration of a portion of a radiativestructure having quantum wells and barriers alternating in accordancewith an embodiment of the presently disclosed technology.

FIG. 6 is a band diagram illustrating the behavior expected of arepresentative structure shown in FIG. 5, in accordance with anembodiment of the presently disclosed technology.

FIGS. 7A and 7B are band diagrams comparing band gap energies forsimulated structures having non-polar characteristics (FIG. 7A) andpolar characteristics (FIG. 7B) in accordance with embodiments of thepresently disclosed technology.

DETAILED DESCRIPTION

Embodiments of the presently disclosed technology are directed generallyto wavelength converters for solid state lighting (“SSL”) devices, andassociated systems and methods. As used hereinafter, the term “SSLdevice” generally refers to devices with light emitting diodes (“LEDs”),organic light emitting diodes (“OLEDs”), laser diodes (“LDs”), polymerlight emitting diodes (“PLEDs”), and/or other suitable sources ofillumination, other than electrical filaments, a plasma, or a gas.Briefly described, a radiation system in accordance with a particularembodiment of the disclosed technology includes a solid state radiativesemiconductor structure that has a first region and a second region. Thefirst region has a first value of a material characteristic, and thesecond region has a second value of the material characteristic that isdifferent than the first value. The first region is positioned toreceive radiation at a first wavelength, and the second region ispositioned adjacent to the first region to emit radiation at a secondwavelength different than the first wavelength. The first and secondvalues of the characteristic form a potential gradient to driveelectrons, holes, or both electrons and holes in the radiative structurefrom the first region to the second region. Accordingly, the secondregion can receive optically generated carriers from the first regionand emit radiation at the second wavelength. In particular embodiments,the radiative semiconductor structure can be positioned proximate to anenergy source that directs radiation at the first wavelength toward thefirst region of the semiconductor structure. In further particularembodiments, the energy source can include a solid state lightingdevice, for example, an LED.

Other systems, methods, features, and advantages of the presentlydisclosed technology will become apparent to one of ordinary skill inthe art. Several details describing structures or processes that arewell-known and often associated with such systems and methods, but thatmay unnecessarily obscure some significant aspects of the disclosure,are not set forth in the following description for purposes of clarity.Moreover, although the following disclosure sets forth severalembodiments of different aspects of the technology disclosed herein,several other embodiments can include different configurations ordifferent components than those described in this section. Accordingly,the disclosed technology may have other embodiments with additionalelements, and/or without several of the elements described below withreference to FIGS. 2-7.

FIG. 2 is a partially schematic, cross-sectional illustration of asystem 200 that receives or absorbs energy at one wavelength andre-radiates or emits energy at another wavelength. In a particularembodiment, the system 200 includes a support 230 carrying a lightsource 250. The light source 250 can include an LED or other SSL device,or another device (e.g., a laser) that emits first radiation at a firstwavelength A. The system 200 further includes a radiative structure 240positioned to receive and absorb the first radiation and emit secondradiation at a different wavelength E. The radiative structure 240 caninclude one or more first regions 241 (e.g., absorptive regions) and oneor more second regions 242 (e.g., emissive regions). For example, in theembodiment shown in FIG. 2, the radiative structure 240 includes twoabsorptive regions 241, shown as a first absorptive region 241 a and asecond absorptive region 241 b, positioned on opposite sides of a singleemissive region 242. As used herein, the term “absorptive region” refersgenerally to a region having suitable (e.g., strong) absorptivecharacteristics at the first wavelength A emitted by the light source250. The term “emissive region” refers generally to a region havingsuitable (e.g., strong) emissive characteristics at the secondwavelength E. In any of these embodiments, the radiative structure 240can replace conventional phosphor structures and can accordingly modifythe spectrum of light emitted by overall system 200 without the use ofphosphors, or with a reduced use of phosphors. Further features andadvantages of representative systems are described below with referenceto FIGS. 3A-7.

Particular embodiments of the presently disclosed technology aredescribed below in the context of radiative structures having differentregions with different material polarizations, resulting, for example,from a difference in material composition or strain of the materialsforming the regions and a particular crystal orientation. In otherembodiments, the material characteristics of the regions can have otherdiffering characteristics. For example, the regions can have differentcompositions that produce different bandgap energies. Particularembodiments are disclosed in co-pending U.S. application Ser. No.13/215,998, filed Aug. 23, 2011, now U.S. Pat. No. 8,975,614, titled“Wavelength Converters for Solid State Lighting Devices, and AssociatedSystems and Methods” (Attorney Docket No. 10829.9046.US00), which isincorporated herein by reference.

FIGS. 3A-3F are schematic perspective views of various crystal planes ina portion of a GaN/InGaN material. In FIGS. 3A-3F, Ga (or Ga/In) and Natoms are schematically shown as large and small spheres, respectively.As shown in FIGS. 3A-3F, the GaN/InGaN material has a wurtzite crystalstructure with various lattice planes or facets as represented bycorresponding Miller indices. A discussion of the Miller index can befound in the Handbook of Semiconductor Silicon Technology by William C.O'Mara.

As used hereinafter, a “polar plane” generally refers to a crystal planein a crystal structure that contains only one type of atom. For example,as shown in FIG. 2A, the polar plane denoted as the “c-plane” in thewurtzite crystal structure with a Miller index of (0001) contains onlyGa atoms. Similarly, other polar planes in the wurtzite crystalstructure may contain only N atoms and/or other suitable type of atoms.

As used hereinafter, a “non-polar plane” generally refers to a crystalplane in a crystal structure that is generally perpendicular to a polarplane (e.g., to the c-plane). For example, FIG. 3B shows a non-polarplane denoted as the “a-plane” in the wurtzite crystal structure with aMiller index of (1120). FIG. 3C shows another non-polar plane denoted asthe “m-plane” in the wurtzite crystal structure with a Miller index of(1010). Both the a-plane and the m-plane are generally perpendicular tothe c-plane shown in FIG. 3A.

As used hereinafter, a “semi-polar plane” generally refers to a crystalplane in a crystal structure that is canted relative to a polar plane(e.g., to the c-plane) without being perpendicular to the polar plane.For example, as shown in FIGS. 3D-3F, each of the semi-polar planes inthe wurtzite crystal structure with Miller indices of (101 3), (1011),and (1122) form an angle with the c-plane shown in FIG. 3A. The angle isgreater than 0° but less than 90°. Only particular examples of crystalplanes are illustrated in FIGS. 3A-3F. Accordingly, the polar,non-polar, and semi-polar planes can also include other crystal planesnot specifically illustrated in FIGS. 3A-3F. In general, the designercan select the material polarization of the materials forming wavelengthconverters in accordance with embodiments of the present disclosure byselecting the angle along which a corresponding epitaxial substrate iscut. This in turn determines the material polarization of the subsequentepitaxially grown layers. In general, different layers will have thesame crystal orientation (as individual layers are grown epitaxially onthe layer below), but will have different material polarizations, e.g.,due to different concentrations of particular constituents, such asindium.

As described above with reference to FIG. 2, wavelength converters inaccordance with the present technology can include one or more first orabsorptive regions, and one or more second or emissive regions. Theemissive regions can receive carriers from adjacent absorptive regionsand can accordingly form quantum wells. FIG. 4 is a representative banddiagram illustrating a conduction band 445 and a valance band 446 for asecond region 242 (e.g., a quantum well) surrounded by correspondingfirst regions 241 a, 241 b. In a particular aspect of this embodiment,the second region 242 is a single, 2 nm-wide gallium indium nitridestructure grown along the c-axis. In still a further particularembodiment, the composition of the second region 242 isGa_(0.78)In_(0.22)N. In other embodiments, the second region 242 caninclude other gallium indium nitride structures, other III-nitrideheterostructures, and/or other non-Group III heterostructures (e.g.,Group II or Group VI heterostructures). In any of these embodiments, thesecond region 242 can form interfaces (e.g., heterointerfaces) 444 atthe junctions between the second region 242 and the surrounding firstregions 241 a, 241 b. The heterointerfaces 444 may be graded or abrupt,depending upon the particular embodiment. In general, based on thedifferent material polarizations in the first and second regions, theheterointerfaces create electric fields that assist in the transport ofoptically generated electron-hole pairs from the first regions 241 a,241 b to the second region 242.

In a particular aspect of an embodiment shown in FIG. 4, thediscontinuity in the polarization field between the second region 242and the adjacent first regions 241 a, 241 b creates a negative sheetcharge to the left of the second region 242. This negative sheet chargerepels electrons and pushes the edge of the conduction band 445 upwards.To the right of the second region 242 is a positive sheet charge whichattracts electrons and pulls the edge of the conduction band 445 down.The electric field to the left of the second region 242 pushes electronsto the left, as indicated by arrow R1. In the second region 242, anelectric field pushes the electrons to the right, as indicated by arrowR2. Holes are pushed in the opposite direction: to the right in thefirst region 241 a (as indicated by arrow R3) and to the left in thesecond region (as indicated by arrow R4).

As described further below with reference to FIGS. 5-7B, radiativestructures can be designed with multiple quantum wells separated bycorresponding barriers in such a way that the polarization mismatches atthe heterointerfaces between these structures create electric fieldsthat funnel carriers (e.g., holes and/or electrons) into the adjacentlayers, so as to produce emitted light at a target wavelength.

FIG. 5 is a schematic illustration of a representative radiativestructure 540 that includes multiple quantum wells 542 (four are shownin FIG. 5), interleaved with multiple barriers 543 (four are shown inFIG. 5), and sandwiched between corresponding first regions 541 a, 541b. Embodiments of the present disclosure are not limited to those shownin FIG. 5. For example, other embodiments can include any suitablenumber of quantum wells and barriers, depending on devicecharacteristics. In particular embodiments, the first regions 541 a, 541b can include N—GaN. In the illustrated embodiment, the lower firstregion 541 a can provide a substrate for epitaxial growth of thebarriers 543 and the quantum wells 542. The upper first region 541 b canbe eliminated in some embodiments. However, an advantage of the upperfirst region 541 b is that it can separate the quantum wells 542 fromthe outermost surface of the structure 540, thus reducing or eliminatingsurface charges that can adversely affect the performance of thestructure 540. The quantum well composition can be Ga_(0.78)In_(0.22)N,and the barrier composition can be Ga_(0.9)In_(0.1)N, in particularembodiments, and can have other compositions in other embodiments. Thedoping concentration can be 5×10¹⁸ cm⁻³ in the N—GaN and in the barriers543, and can have other values in other embodiments. The quantum wells542 and corresponding barriers 543 are stacked (e.g., grown) generallyperpendicular to the c-axis, as shown in FIG. 5. In other embodiments,the barriers 543 can be N—GaN without indium. However, an advantage ofincluding indium (or another suitable element) is that it is expected toincrease the absorptivity of the barriers 543, and therefore thewavelength conversion efficiency of the structure 540. In still furtherembodiments, materials other than GaInN can be used for the quantumwells 542 and the barriers 543. Suitable materials include zinc oxide orother materials having a wurtzite crystal structure.

FIG. 6 illustrates a band diagram corresponding to the structuredescribed above with reference to FIG. 5. Each of the quantum wells 542has a well width W_(w) of approximately 2 nanometers, and each barrier543 has a barrier width W_(B) of approximately 10 nanometers.Accordingly, the total absorption thickness (e.g., the thickness ofmaterial absorbing incident radiation at a first wavelength) is 48nanometers, while the total quantum well thickness is 8 nanometers. Boththe barriers 543 and the quantum wells 542 absorb incident light. As thelight is absorbed, it generates electrons and holes (e.g., opticallygenerated carriers). When the electrons and holes are located in thequantum wells 542, they are at an electropotential minimum (or relativeminimum) and are accordingly confined. When electrons are located in thebarriers 543, they experience an electric field, which pushes theelectron toward a nearby quantum well 542. For example, in the left-mostbarrier 543 shown in FIG. 6, electrons are pushed to the right, asindicated by arrow R5. In the next three barriers 543, the electrons arepushed to the left, as indicated by arrows R6. In a generally similarmanner, holes located in a barrier are pushed toward a correspondingquantum well by the field resulting from the difference in polarizationbetween the barrier 543 and the quantum well 542. For example, holes inthe right-most three barriers 543 are forced to the right as indicatedby arrows R7 and into the adjacent quantum wells 542. Holes in theleftmost barrier 543 are pushed into the adjacent first region 541 a asindicated by arrow R8. In this manner, the polarization-induced fieldsact to funnel electrons and holes into the adjacent quantum wells 542,where they may combine efficiently and emit light (or other radiation)at the target wavelength.

FIGS. 7A and 7B illustrate the results of a numerical simulationconducted to demonstrate the efficacy of structures havingcharacteristics generally similar to those described above withreference to FIGS. 2-6. In this particular simulation, the structuresinclude a stack of nine quantum wells 542, each having a width ofapproximately 3 nanometers and a composition of Ga_(0.8)In_(0.2)N.Neighboring quantum wells 542 are separated by barriers 543 having awidth of approximately 100 nanometers and a composition ofGa_(0.9)In_(0.1)N. The outermost quantum wells are positioned adjacentto layers of gallium nitride 541 a, 541 b. The silicon dopingconcentration is 5×10¹⁸ cm⁻³ in the gallium nitride 541 a, 541 b and1×10¹⁸ cm ⁻³ in the barriers 543. Non-radiative recombination lifetimesin the barriers are assumed to be 5 nanoseconds for both electrons andholes. FIG. 7A illustrates a simulation for which the polarizationwithin the structure is zero. This case is analogous to potentialwavelength conversion structures with non-polar semiconductors, or withpolar semiconductors, but along non-polar directions. FIG. 7Billustrates the results when the polarization within the structure isthe predicted amount for c-plane gallium indium nitrideheterostructures. In both simulations, all layers are assumed to bepseudomorphic (e.g., strained).

The simulation method solves the Poisson equation and continuityequations for electrons and holes self-consistently. The boundarycondition for the simulation is that no current flows in or out of thestructure, which is the case if the structure is not connected to anelectrical circuit. An undepleted optical pump is assumed to generateelectron-hole pairs uniformly within both the quantum wells 542 and thebarriers 543. This pump corresponds to an LED or other light source thatgenerates the optical energy absorbed by the radiative structure andreemitted at a different wavelength. The total number of generatedcarriers is assumed to be equal for the results shown in both FIGS. 7Aand 7B, and the carriers are permitted to move freely through drift anddiffusion processes and recombine either non-radiatively (throughShockley-Reed-Hall recombination or Auger recombination) or radiatively,thereby generating light.

Still referring to FIGS. 7A and 7B, the steady state band diagrams ofthe two structures in the presence of optical excitation are shown. Theelectron and hole quasi-Fermi levels are separated, as expected. Thedifferences between the two cases are clearly shown. In FIG. 7B, thepolarization produces electric fields that exist in the barriers 543 andthat act to direct carriers toward the quantum wells 542 where theyaccumulate to sufficiently high densities to recombine efficiently. Thisis not the case for the structure without polarization (shown in FIG.7A), where the lifetime of the carriers generated in the barriers 543will be longer.

The ultimate output of the calculation based on the foregoingsimulations is the relative rate of radiative and non-radiativerecombination. In the structure represented by FIG. 7B, theShockley-Reed-Hall recombination rate was reduced by 30.9%, while theradiative rate was increased by 17.6%. Accordingly, FIGS. 7A and 7Bdemonstrate the efficiency enhancement that may be obtained by takingadvantage of polarization-enhanced carrier capture.

One feature of at least some of the foregoing embodiments describedabove with reference to FIGS. 2-7B is that the disclosed technology caninclude structures that are selected based on crystal-based materialpolarization to concentrate carriers in regions selected to emitradiation at particular wavelengths. These structures can moreefficiently convert energy received at one wavelength to energy emittedat a second wavelength. An advantage of this arrangement is that it canreduce power consumed by the device, and/or increase the light output bythe device, when compared with conventional wavelength converters, forexample, phosphor coatings and the like. In particular, the radiativestructure can be manufactured and operated without a phosphor.

From the foregoing, it will be appreciated that specific embodiments ofthe disclosed technology have been described herein for purposes ofillustration, but that various modifications may be made withoutdeviating from the disclosed technology. For example, materials havingdifferent material polarizations can be combined based on isotropicand/or anisotropic material polarizations. The material polarizations ofadjacent elements in a wavelength converter structure can changeabruptly at the hetero interfaces, as was generally shown above, orgradually, e.g., by gradually varying the concentration of indium at thehetero interfaces between GaInN barriers and quantum wells. Certainembodiments of the technology were described in the context ofparticular materials (e.g., gallium nitride and gallium indium nitride),but in other embodiments, other materials can be used to produce similarresults. Certain embodiments of the technology were described above inthe context of shifting the wavelength of visible light. In otherembodiments similar structures and methods can be used to shift energyat other wavelengths.

Certain aspects of the technology described in the context of particularembodiments may be combined or eliminated in other embodiments. Forexample, particular embodiments can include more or fewer barriers andquantum wells than described above with reference to FIGS. 5-7B. Thewavelength conversion structure can include a single first region ratherthan two, e.g., if the first region is properly doped. The structuresdescribed above can be combined with additional structures (e.g.,lenses, power sources controllers, and/or other devices) depending uponthe functions the structures are intended to perform. Further, whileadvantages associated with certain embodiments have been described inthe context of those embodiments, other embodiments may also exhibitsuch advantages, and not all embodiments need necessarily exhibit suchadvantages to fall within the scope of the present technology.Accordingly, the present disclosure and associated technology canencompass other embodiments not expressly shown or described herein.

I/We claim:
 1. A solid-state radiation system, comprising: a lightemitting diode (LED) configured to emit first light having a firstwavelength; and a semiconductor wavelength converter coupled with theLED, the semiconductor wavelength converter including a first absorptiveregion connected to the LED, the first absorptive region configured toreceive the first light and to generate carriers in response toreceiving the first light, and a first emissive region having a firstside connected to the first absorptive region, the first emissive regionconfigured to receive the carriers and to emit, in response to receivingthe carriers, a second light having a second wavelength different fromthe first wavelength, wherein a combination of the first light and thesecond light emulates white light.
 2. The solid-state radiation systemof claim 1, wherein the semiconductor wavelength converter furthercomprises a second absorptive region connected to a second side of thefirst emissive region such that the first emissive region forms aquantum well structure disposed between the first and second absorptiveregions.
 3. The solid-state radiation system of claim 1, wherein thefirst emissive region includes a semiconductor material having a bandgapenergy corresponding to the second wavelength.
 4. The solid-stateradiation system of claim 1, wherein the first absorptive regionincludes a first material polarization, and the first emissive regionincludes a second material polarization that is different from the firstmaterial polarization.
 5. The solid-state radiation system of claim 4,wherein the first absorptive region and the first emissive regioninclude an interface having a discontinuity in a polarization fieldbetween the first and second material polarizations such that anelectric field is created at the interface, the electric fieldconfigured to assist the first emissive region to receive the carriersfrom the first absorptive region.
 6. The solid-state radiation system ofclaim 1, wherein the first emissive region includes a semiconductormaterial having a wurtzite crystal structure.
 7. The solid-stateradiation system of claim 1, wherein the carriers include electrons,holes, or both.
 8. The solid-state radiation system of claim 1, furthercomprising a support structure carrying the LED.
 9. A semiconductorwavelength converter, comprising: a substrate; and an alternatingarrangement of multiple quantum well structures and multiple barrierlayers in a stack formed on the substrate, with at least one quantumwell structure disposed between a first barrier layer and a secondbarrier layer, wherein individual barrier layers are positioned toreceive first light having a first wavelength and configured to generatecarriers in response to receiving the first light, and the at least onequantum well structure is configured to receive the carriers from thefirst and second barrier layers and to emit, in response to receivingthe carriers, a second light having a second wavelength different fromthe first wavelength, wherein a combination of the first light and thesecond light emulates white light.
 10. The semiconductor wavelengthconverter of claim 9, wherein individual quantum well structures includea semiconductor material having a bandgap energy corresponding to thesecond wavelength.
 11. The semiconductor wavelength converter of claim9, wherein the individual barrier layers include a first semiconductormaterial having a first material polarization value and individualquantum well structures include a second semiconductor material having asecond material polarization value that is different from the firstmaterial polarization value.
 12. The semiconductor wavelength converterof claim 11, wherein the substrate comprises GaN prepared forepitaxially forming the stack including the first and secondsemiconductor materials corresponding to the alternating arrangement ofthe multiple quantum well structures and the multiple barrier layers,the first and second semiconductor materials having a common crystalorientation.
 13. The semiconductor wavelength converter of claim 11,wherein the first and second semiconductor materials include indium as acommon constituent, and wherein a first concentration of indium in thefirst semiconductor material is approximately one-half or less of asecond concentration of indium in the second semiconductor material. 14.The semiconductor wavelength converter of claim 9, wherein the at leastone quantum well structure comprises a first heterointerface including afirst electric field configured to funnel a first type of carriers intothe at least one quantum well structure, the first electric fieldcreated based on a discontinuity in a polarization field correlated to adifference between a first material polarization value associated withthe barrier layers and a second material polarization value associatedwith the quantum well structures.
 15. The semiconductor wavelengthconverter of claim 14, wherein the at least one quantum well structurefurther comprises a second heterointerface including a second electricfield configured to funnel a second type of carriers into the at leastone quantum well structure, the second electric field created based onthe discontinuity in the polarization field.
 16. The semiconductorwavelength converter of claim 9, wherein the at least one quantum wellstructure is strained.
 17. The semiconductor wavelength converter ofclaim 9, wherein the at least one quantum well structure is configuredto emit the second light based on radiative recombination between afirst type of carriers and a second type of carriers therein, withoutradiating an energy from a phosphor converter material.
 18. Asolid-state lighting device, comprising: a light source configured toemit first light having a first wavelength; and a semiconductorwavelength converter coupled with the light source, the semiconductorwavelength converter including; an alternating arrangement of multiplequantum well structures and multiple barrier layers in a stackepitaxially grown on a substrate, with at least one quantum wellstructure disposed between consecutive barrier layers, whereinindividual barrier layers are positioned to receive the first light andconfigured to generate carriers therein in response to receiving thefirst light, and the at least one quantum well structure is configuredto receive the carriers from the consecutive barrier layers and to emit,in response to receiving the carriers, a second light having a secondwavelength different from the first wavelength, wherein a combination ofthe first light and the second light emulates white light.
 19. Thesolid-state lighting device of claim 18, wherein the second light isbased at least in part on radiative recombination between a first typeof carriers and a second type of carriers in the at least one quantumwell structure, without radiating an energy from a phosphor convertermaterial.
 20. The solid-state lighting device of claim 18, wherein adifference between a first material polarization value associated withthe individual barrier layers and a second material polarization valueassociated with individual quantum well structures is determined toassist transporting the carriers to the at least one quantum wellstructure.